Applications

• The UVISEL FUV is able to obtain
• Thin film thickness from 1 Å to 30 µm
• Surface and interface roughness
• Optical constants (n, k) for isotropic, anisotropic and graded films

• The UVISEL FUV is the ideal tool for
• Semiconductor
• Lithography
• Data storage
• Chemical and biological engineering
• Display devices
  
  

• Characterization of thickness and optical constants in the VIS-FUV spectral range of thin films and multilayer stacks for:
• Dielectrics
• High k, low k materials
• Photo resists
• Plastics
• Amorphous semiconductors
• Thin metal films
• Glass
• Polymers
  
  

• High sensitivity for the measurements of ultra-thin films, films with low index contrast and complex films exhibiting gradient or anisotropy