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Labs and Equipment

The Surface Analysis and Corrosion Science Laboratory, directed by Dr. Halada in the Department of Materials Science and Chemical Engineering is a 1200 square foot state-of-the-art analytical facility containing two X-ray Photoelectron Spectroscopy (XPS) systems: (1) a custom variable angle X-ray Photoelectron Spectroscopy (XPS) system also equipped to perform sub-micron spot Auger Electron Spectroscopy and in situ exposure studies via an attached glove box, and (2) a Physical Electronics Quantum 2000 XPS microprobe.  The custom XPS system is equipped with a VG hemispherical analyzer, PHI aluminum and magnesium X-ray sources, multiple sample holders with liquid nitrogen cooling, and multi-stage pumping. The Quantum 2000 is capable of chemical mapping, and is equipped with a 16 channel detector, flood gun for charge compensation (facilitating analysis of surfaces with limited conductivity), and an ion gun for chemical profiling.  In addition, the Laboratory contains a custom designed Ga ion static Secondary Ion Mass Spectroscopy (SIMS) system with a spot size of 0.2 microns to allow chemical mapping of surfaces with a detection level approaching the ppm range for many species. Vibrational and optical spectroscopy equipment available includes a Thermo Electron IS50 FTIR spectrometer for mid and far range infrared analysis with multiple sampling accessories for surface and diffuse reflectance, and is equipped with a state-of-the-art Continuum IR microscope. The microscope is equipped with optics for diffuse reflectance microspectroscopy, diamond crystal ATR microspectroscopy, and a unique grazing angle objective for thin film analysis.  Accessories (including microsample handling) and a detector for photoacoustic IR spectroscopy have also recently been added to the system. The laboratory also contains an Almega dispersive Raman spectrometer with confocal microscopy and external attachment points for custom-designed experimental sampling facilities.  The Raman microspectroscopy system includes high resolution optics (with 0.6 micron resolution and chemical mapping capabilities) and dual laser sources (532 nm and 785 nm lasers).  The Laboratory also contains a Thermo Niton Xl3t X-ray Fluorescence analyzer with a broad range of elemental detection capabilities (in the low ppm range). All systems are operated with standard PC’s, and spectral libraries and data fitting software are available to assist in analysis of data.

 

Overall, this combination of advanced analytical XPS/Auger/SIMS/XRF/Infrared/optical facilities allow for state-of-the-art surface characterization and chemical mapping.

 

Electrochemical synthesis and analysis: Our 600 square foot electrochemical analysis facility includes three potentiostats (two Gamry and one Pine Wave Driver model) capable of nA range current measurement with PC-based computer control and data acquisition and analysis systems, and electrochemical impedance and noise analysis systems.  Additional electrochemical equipment includes a Pine rotating disc electrode and dual potentiostat, and a selection of reference electrodes and electrochemical cell configurations adaptable for a range of sample sizes and configurations.   The laboratory is well equipped with a fume hood, glassware, pH test equipment, doubly distilled water system, vacuum filtration and centrifuge equipment, and gas delivery and chemical storage facilities.  Several controlled atmosphere glove boxes are also available to allow for sample preparation and transfer to the spectrometer facilities without risk of environmental contamination or atmospheric surface reaction. Available equipment for UV exposure of samples includes a Q-Sun Xe-1 xenon test chamber as well as a high intensity Cole Parmer long wave UV lamp (365 nm; 21W/cm2 at 4 cm).

Vibrational spectroscopy            Vibrational Spectroscopy (FTIR)FTIR

XPS  Custom design X-ray Photoelectron Spectroscopy (XPS) system

XRF Portable X-ray Fluorescence (XRF) system

Laser-exposure vacuum system Custom designed laser exposure vacuum system (designed for laser ablation).