For membrane separation technology, preparing a very thin barrier layer with high selectivity, high throughput, low fouling, and long lasting properties forms the ultimate set of goals, which the widely used polymeric materials have not been able to achieve. Two dimensional single atomic layer materials, such as graphene and graphene oxide, can be very competitive candidates for the proposed tasks, because there is a set of properties has been conceived for the separation membrane that can potentially achieve the goals by using chemically modified graphene-based materials to satisfy the desirable properties for the barrier layer.
Researchers at Stony Brook University propose that a single atomic layer structure of graphene-based materials provides the possibility of fabricating an ultra-thin barrier layer. Porous surfaces will allow higher permeability. By precisely controlling the parameters during the fabrication, the barrier layer thickness and the assembly of graphene nano-sheets could be well tuned. The produced separation membranes are expected to have higher flux and a higher rejection ratio than existing commercial products and should be useful in many applications.
Adjustable pore sizes and porosity - The spacing between nanosheets can be tuned by selecting different crosslinking reagents - Can form the new separation membrane for nanofiltration, desalination, energy generation, and pervaporation.
Nanofiltration - Desalination - Energy generation - Pervaporation
Benjamin Chu, Distinguished Professor, Chemistry
Benjamin Hsiao, Distinguished Professor, Chemistry
Hongyang Ma, Professor, Chemistry
Zhe Wang, Research Assistant/Ph.D Student, Chemistry
Development partner - Commercial partner - Licensing
Available for license. Stony Brook University is seeking to develop and commercialize, by an exclusive or non-exclusive license agreement and/or sponsored research, with a company active in the area.
Donna Tumminello, Assistant Director, Intellectual Property Partners, firstname.lastname@example.org, 6316324163
Patent application submitted