The objective of our experimentation is the inhibition of metal corrosion utilizing polymer coatings. This destructive redox chemistry applies to all facets of everyday life. By coating thin (~500 Å - ~2000 Å) spuncast films of polyaniline and polyphenyl ether onto copper and aluminum vapor deposited silicon wafers, we hope to retard the synthesis of oxide layers (rust). Our samples were plasma etched with a reactive ion etcher to homogonize the topography of the metal surfaces prior to testing. The samples were then coated with a polymer layer and examined using the atomic force microscope (AFM). The AFM was employed to calculate the roughness and degree of coat compatibility. By utilizing the National Synchotron Light Source at Brookhaven National Laboratories, we were able to calculate the thickness of oxide layers with X-ray reflectivity. Then conductivity was tested using a four-point probe. The secondary ion mass spectrometer was then manipulated to determine the chemical composition of the samples nanolayer by nanolayer. The results were inconclusive, and further research is required.

Funding for this research was provided by Simons Grant 265210.