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spectroscopic ellipsometry

Horiba UVISEL FUV

Applications

  • The UVISEL FUV is able to obtain
    • Thin film thickness from 1 Å to 30 µm
    • Surface and interface roughness
    • Optical constants (n, k) for isotropic, anisotropic and graded films
  • The UVISEL FUV is the ideal tool for
    • Semiconductor
    • Lithography
    • Data storage
    • Chemical and biological engineering
    • Display devices
  • Characterization of thickness and optical constants in the VIS-FUV spectral range of thin films and multilayer stacks for:
    • Dielectrics
    • High k, low k materials
    • Photo resists
    • Plastics
    • Amorphous semiconductors
    • Thin metal films
    • Glass
    • Polymers
  • High sensitivity for the measurements of ultra-thin films, films with low index contrast and complex films exhibiting gradient or anisotropy
Ellipsometry
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